Performance of Chemical Vapor Deposited ZnO thin film as thermal interface material on optical properties of LED

  • Nur Jassriatul Aida bt Jamaludin Universiti Sains Malaysia, Penang
  • S. Shanmugan Universiti Sains Malaysia, Penang
  • D. Mutharasu Universiti Sains Malaysia, Penang


Chemical Vapor Deposition (CVD) was used for the synthesis of ZnO thin film on Al substrates at various flow rates of O2 gas. ZnO thin film coated substrates were tested as thermal substrates on influencing the optical properties of high power LED at various operating currents. Spectrometer analysis showed that ZnO thin film prepared at 10 sccm O2 flow rate showed better performance by reducing the Color Correlated Temperature (CCT) at driving currents. CCT values were maintained with respect to driving currents by ZnO thin film interface at all driving currents than air interface (bare Al substrate). On luminous flux analysis, 5 sccm samples showed good performance on increasing the light of the give LED at all driving currents than bare Al boundary condition. The observed results were evidenced with help of particle size distribution analysis on all film surface using Nanoscope software. Overall, ZnO thin film deposited at low O2 flow rate would be an alternative to solid thin film interface material in electronic packaging applications.


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Author Biographies

Nur Jassriatul Aida bt Jamaludin, Universiti Sains Malaysia, Penang
Student, School of Physics
S. Shanmugan, Universiti Sains Malaysia, Penang
Senior Lecturer, School of Physics
D. Mutharasu, Universiti Sains Malaysia, Penang
Associate Professor, School of Physics


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How to Cite
AIDA BT JAMALUDIN, Nur Jassriatul; SHANMUGAN, S.; MUTHARASU, D.. Performance of Chemical Vapor Deposited ZnO thin film as thermal interface material on optical properties of LED. International Journal of Research and Engineering, [S.l.], v. 4, n. 4, p. 114-118, apr. 2017. ISSN 2348-7860. Available at: <>. Date accessed: 17 nov. 2017.